Reflection High-Energy Electron Diffraction
Scanwel offers two solutions for RHEED, which is mainly used in parallel to deposition techniques to characterise crystallinity, geometry and thickness of thin films during their growth. The goal of the technique is to control and report the quality of the deposited films.
The benefits
The Specs RHD-30 is a 30 kV RHEED electron gun which is a fully UHV-compatible RHEED gun, bakeable to 200 °C, and includes all the features and options required to take advantage of this powerful analysis technique. Operation in pressures of up to 1mbar is possible with the addition of the NAP (Near Ambient Pressure) system, which provides differential pumping to the RHD-30. This enables RHEED in applications such as molecular beam epitaxy, thin film deposition, chemical vapour deposition, sputter deposition and other coating and deposition techniques.
The Createc RHEED System has three different primary beam energies available 15kV, 20kV and 30kV, all of which are UHV compatible and bakeable to 200 °C . Operating in pressures up to 5x10-2 mbar is possible with the addition of differential pumping sets. CreaTec has developed the SAFIRE software, which is a powerful and easy to use RHEED evaluation tool. SAFIRE can handle an arbitrary number of parallel measurements and offers fast real-time data exchange with MBE controller, for closed feedback loop operation. Multiple measurements can be stored in the same display for comparison.
RHEED screen sets are also available,. They consist of a viewport shutter, a viewport with RHEED screen, a camera holder and a digital camera.