Physical Vapour Deposition

Physical Vapour deposition, or PVD, is a cover-all term for a variety of in-vacuum deposition methods including magnetron sputtering, pulsed laser deposition, thermal and e-beam evaporation. It is a process used to produce a vapour of metal or other material in the form of atoms, molecules or ions in order to deposit thin layers onto a substrate material.

With our partner companies we are pleased to offer cutting edge turn-key PVD systems, as well as components for existing systems and self-build kits (Scanwel chamber + sources + pumps etc). Systems can be of a variety of sizes for different sized substrates with varying degrees of automation.